J. Schneir, R. Sonnenfeld, et al.
Physical Review B
We examine individual Si nanowires grown by the vapor-liquid-solid mechanism, using real-time in situ ultra high vacuum transmission electron microscopy. By directly observing Au-catalyzed growth of Si wires from disilane, we show that the growth rate is independent of wire diameter, contrary to the expected behavior. Our measurements show that the unique rate-limiting step here is the irreversible, kinetically limited, dissociative adsorption of disilane directly on the catalyst surface. We also identify a novel dependence of growth rate on wire taper. © 2006 The American Physical Society.
J. Schneir, R. Sonnenfeld, et al.
Physical Review B
J.B. Hannon, J. Tersoff, et al.
Physical Review Letters
M.D. Johnson, K.T. Leung, et al.
Surface Science
F.M. Ross, P.A. Bennett, et al.
Micron