Conference paper
PLASMA POTENTIALS IN rf GLOW DISCHARGES.
J.W. Coburn, K. Koehler
Symposium on Plasma Processing 1986
Paper
Effect of ion bombardment on the plasma-assisted etching and deposition of plasma perfluoropolymer thin films
Abstract
A study of the etching and deposition of plasma perfluoropolymer thin films has been carried out by using quartz-crystal microbalance methods for a range of feed gas mixtures.
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