PaperIon-beam-assisted etching of Si with fluorine at low temperaturesC.B. Mullins, J.W. CoburnJournal of Applied Physics
PaperPlasma potentials of 13.56-MHz rf argon glow discharges in a planar systemK. Köhler, J.W. Coburn, et al.Journal of Applied Physics
PaperConductance considerations in the reactive ion etching of high aspect ratio featuresJ.W. Coburn, Harold F. WintersApplied Physics Letters
PaperFrequency dependence of ion bombardment of grounded surfaces in rf argon glow discharges in a planar systemK. Köhler, D.E. Horne, et al.Journal of Applied Physics
