Conference paper
PLASMA POTENTIALS IN rf GLOW DISCHARGES.
J.W. Coburn, K. Koehler
Symposium on Plasma Processing 1986
Paper
Effect of ion bombardment on the plasma-assisted etching and deposition of plasma perfluoropolymer thin films
Related
F. Fracassi, J.W. Coburn
Journal of Applied Physics
U. Gerlach-Meyer, J.W. Coburn, et al.
Surface Science
Conference paper
Role of ions in reactive ion etching
J.W. Coburn
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films