Role of ions in reactive ion etching
- J.W. Coburn
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
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51 results for J.W. Coburn
Surface processes in plasma-assisted etching
- J.W. Coburn
- 1990
- Symposium on Process Physics and Modeling in Semiconductor Technology 1990
PLASMA POTENTIALS IN rf GLOW DISCHARGES.
- J.W. Coburn
- K. Koehler
- 1986
- Symposium on Plasma Processing 1986
Dual atom beam studies of etching and related surface chemistries
- J.W. Coburn
- 2009
- Pure and Applied Chemistry
A study of the neutral species rf sputtered from oxide targets
- J.W. Coburn
- E. Taglauer
- et al.
- 2014
- Japanese Journal of Applied Physics
Electron-beam effects in depth profiling measurements with Auger electron spectroscopy
- J. Ahn
- C.R. Perleberg
- et al.
- 2008
- Journal of Applied Physics
Elemental composition profiling in thin films by glow-discharge mass spectrometry: Depth resolution
- J.W. Coburn
- E.W. Eckstein
- et al.
- 2008
- Journal of Applied Physics
Influence of the altered layer on depth profiling measurements
- Harold F. Winters
- J.W. Coburn
- 2008
- Applied Physics Letters
Plasma etching a "pseudo-black-box" approach
- Harold F. Winters
- J.W. Coburn
- et al.
- 2008
- Journal of Applied Physics
Ion-surface interactions in plasma etching
- J.W. Coburn
- H.F. Winters
- et al.
- 2008
- Journal of Applied Physics