A study of the neutral species rf sputtered from oxide targets
- J.W. Coburn
- E. Taglauer
- et al.
- 2014
- Japanese Journal of Applied Physics
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51 results for J.W. Coburn
Dual atom beam studies of etching and related surface chemistries
- J.W. Coburn
- 2009
- Pure and Applied Chemistry
Elemental composition profiling in thin films by glow-discharge mass spectrometry: Depth resolution
- J.W. Coburn
- E.W. Eckstein
- et al.
- 2008
- Journal of Applied Physics
Electron-beam effects in depth profiling measurements with Auger electron spectroscopy
- J. Ahn
- C.R. Perleberg
- et al.
- 2008
- Journal of Applied Physics
Influence of the altered layer on depth profiling measurements
- Harold F. Winters
- J.W. Coburn
- 2008
- Applied Physics Letters
Ion-surface interactions in plasma etching
- J.W. Coburn
- H.F. Winters
- et al.
- 2008
- Journal of Applied Physics
Plasma etching a "pseudo-black-box" approach
- Harold F. Winters
- J.W. Coburn
- et al.
- 2008
- Journal of Applied Physics
The etching of silicon with XeF2 vapor
- H.F. Winters
- J.W. Coburn
- 2008
- Applied Physics Letters
Magnetic field control of reactive plasma etching
- V.J. Minkiewicz
- M. Chen
- et al.
- 2008
- Applied Physics Letters
In situ Auger electron spectroscopy of Si and SiO2 surfaces plasma etched in CF4-H2 glow discharges
- J.W. Coburn
- 2008
- Journal of Applied Physics