Noelia Vico Triviño, Philipp Staudinger, et al.
PVLED 2019
We illustrate the propagation of light in a new type of coupling mask for lensless optical lithography. Our investigation shows how the different elements comprising such masks contribute to the definition of an optical path that allows the exposure of features in the 100-nm-size range in the photoresist. ©1998 Optical Society of America.
Noelia Vico Triviño, Philipp Staudinger, et al.
PVLED 2019
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OFC 2022
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