Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
The recombination of chlorine atoms has been investigated by flash photolysis in the inert gases He, Ne, Ar, N2, CO2, CF4, SiF4, SF6, and C2F6. The pressure dependence of the reaction has been measured between 0.5 and about 100 atm for He, N2, and CO2. Experiments on the NO‐catalyzed recombination of chlorine in the presence of He (0.5–100 atm) permitted a determination of the falloff curve of the reaction Cl+NO(+He)→ClNO(+He). Copyright © 1976 John Wiley & Sons, Inc.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
David B. Mitzi
Journal of Materials Chemistry
Hiroshi Ito, Reinhold Schwalm
JES
I. Morgenstern, K.A. Müller, et al.
Physica B: Physics of Condensed Matter