S. Cohen, T.O. Sedgwick, et al.
MRS Proceedings 1983
We have developed four different fabrication processes based on self-organizing diblock copolymers that all produce densely-spaced, uniformly-sized nanometer-scale dot arrays over large wafer areas. We demonstrate the versatility of these techniques through examples of dot arrays formed of metallic, insulating, and polymeric materials. These fabrication processes vary in complexity, utility, and degree of optimization, and we discuss the relative merits of each. The ability to create uniform nanoscale features below lithographic resolution limits may enable key applications in fields such as magnetic recording and microelectronics.
S. Cohen, T.O. Sedgwick, et al.
MRS Proceedings 1983
Hiroshi Ito, Reinhold Schwalm
JES
Fernando Marianno, Wang Zhou, et al.
INFORMS 2021
Ranulfo Allen, John Baglin, et al.
J. Photopolym. Sci. Tech.