A. Reisman, M. Berkenblit, et al.
JES
The susceptibility of most chemically amplified resists to performance degradation caused by low levels of airborne basic chemical substances presents a significant barrier to their practical implementation. We have carried out a series of systematic studies intended to improve our understanding of the mechanism of such degradation. We summarize here our investigation of how the contaminant/resist interaction is influenced by resist film composition. Our results suggest that contamination effects can be minimized y targeting specific ranges of physical properties when designing the matrix polymer. © 1993, The Society of Photopolymer Science and Technology(SPST). All rights reserved.
A. Reisman, M. Berkenblit, et al.
JES
David B. Mitzi
Journal of Materials Chemistry
J.R. Thompson, Yang Ren Sun, et al.
Physica A: Statistical Mechanics and its Applications
Elizabeth A. Sholler, Frederick M. Meyer, et al.
SPIE AeroSense 1997