Patterning material challenges for improving euv stochastics
- Anuja De Silva
- Luciana Meli
- et al.
- 2019
- J. Photopolym. Sci. Tech.
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68 results at J. Photopolym. Sci. Tech.
Reactive monolayers in directed additive manufacturing – area selective atomic layer deposition
- Rudy J. Wojtecki
- Anuja DeSilva
- et al.
- 2018
- J. Photopolym. Sci. Tech.
Synthesis and thin-film self-assembly of cylinder-forming high- χ block copolymers
- Ankit Vora
- Gabriela Alva
- et al.
- 2016
- J. Photopolym. Sci. Tech.
Development of liquid photoresist for IMS (Injection molded solder) with high thermal stability
- Jun Mukawa
- Seiichirou Takahashi
- et al.
- 2016
- J. Photopolym. Sci. Tech.
Interfacial layers with photoswitching surface energy for block copolymer alignment and directed self-assembly
- Michael J. Maher
- Christopher M. Bates
- et al.
- 2015
- J. Photopolym. Sci. Tech.
Synthesis and characterization of polycarbonate-containing all-organic High-χ block copolymers for directed self-assembly
- Ankit Vora
- Anindarupa Chunder
- et al.
- 2015
- J. Photopolym. Sci. Tech.
Directed self-assembly of topcoat-free, Integration-friendly high-χ block copolymers
- Ankit Vora
- Anindarupa Chunder
- et al.
- 2014
- J. Photopolym. Sci. Tech.
Leveraging resist chemistry research for water purification membrane technology
- Robert D. Allen
- Young-Hye Na
- et al.
- 2010
- J. Photopolym. Sci. Tech.
Integration of directed self-assembly with 193 nm lithography
- Daniel P. Sanders
- Joy Cheng
- et al.
- 2010
- J. Photopolym. Sci. Tech.
Fluorine-free photoacid generators for 193 nm lithography based on non-sulfonate organic superacids
- Martin Glodde
- Sen Liu
- et al.
- 2010
- J. Photopolym. Sci. Tech.