Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
The extension of rotating-compensator ellipsometry (RCE) to measurements of the system Jones matrix J of optical systems is reported. The similarities and differences of generalized RCE as compared to other methods are noted. Measurements of several anisotropic materials, as well as of "standard" optical systems having one, two and three essential (complex) elements of J are described. Finally, a completely automated procedure for the measurement and analysis of a uniaxially anisotropic surface with the optic axis in the plane of the surface is presented. © 1976.
Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
U. Wieser, U. Kunze, et al.
Physica E: Low-Dimensional Systems and Nanostructures
Hiroshi Ito, Reinhold Schwalm
JES
William Hinsberg, Joy Cheng, et al.
SPIE Advanced Lithography 2010