Robert W. Keyes
Proceedings of the IEEE
Suitably strained silicon exhibits a mobility anisotropy that can be used to advantage in field-effect transistors. The desired strain can be achieved through heteroepitaxy. Copyright © 1986 by The Institute of Electrical and Electronics Engineers, Inc.
Robert W. Keyes
Proceedings of the IEEE
Robert W. Keyes
Physical Review B
Robert W. Keyes, Fred W. Blair
Proceedings of the IEEE
Robert W. Keyes
IEEE Circuits and Devices Magazine