Conference paper
Future of PECVD and spin-on ultra low-k materials
Willi Volksen, Theo Frot, et al.
IITC/MAM 2011
The reaction of atomic hydrogen with adsorbed Br is compared on Si(100) and Si(111) surfaces from 50°C to 300°C. On both surfaces, Br removal rate is first order in atomic hydrogen flux, first-order in Br coverage, and exhibits a near zero activation energy. On Si(111), this rate also depends on surface hydrogen coverage, indicating that different mechanisms occur on these surfaces. © 1993 American Institute of Physics.
Willi Volksen, Theo Frot, et al.
IITC/MAM 2011
D.D. Koleske, S. Gates
The Journal of Chemical Physics
D.D. Koleske, S. Gates, et al.
The Journal of Chemical Physics
L. Clevenger, M. Yoon, et al.
ADMETA 2004