J. Woodall, Alan C. Warren, et al.
IEE/LEOS Summer Topical Meetings 1991
The interface states at metal-semiconductor junctions are still a matter of debate. We present a novel approach to this issue that uses state-of-the-art techniques to prepare silicon surfaces with different surface terminations and employs non-interacting Schottky contacts to measure the barrier height. We report a difference of 50 mV in barrier height for Hg Schottky diodes on Si(111) surfaces with different surface terminations. © 1993.
J. Woodall, Alan C. Warren, et al.
IEE/LEOS Summer Topical Meetings 1991
M. Wittmer, J. Freeouf
EPL
D.K. Sadana, H.J. Hovel, et al.
IEEE International SOI Conference 1993
P.D. Kirchner, J. Woodall, et al.
Applied Physics Letters