H.-C.W. Huang, M. Wittmer, et al.
JES
The interface states at metal-semiconductor junctions are still a matter of debate. We present a novel approach to this issue that uses state-of-the-art techniques to prepare silicon surfaces with different surface terminations and employs non-interacting Schottky contacts to measure the barrier height. We report a difference of 50 mV in barrier height for Hg Schottky diodes on Si(111) surfaces with different surface terminations. © 1993.
H.-C.W. Huang, M. Wittmer, et al.
JES
W.D. Grobman, D.E. Eastman, et al.
Physical Review B
J. Freeouf, J.C. Tsang, et al.
Physical Review Letters
D.E. Eastman, W.D. Grobman, et al.
Physical Review B