O.F. Schirmer, K.W. Blazey, et al.
Physical Review B
We report a new method to fabricate electrode-embedded multiple nanopore structures with sub-10 nm diameter, which is designed for electrofluidic applications such as ionic field effect transistors. Our method involves patterning pore structures on membranes using e-beam lithography and shrinking the pore diameter by a self-limiting atomic layer deposition process. We demonstrate that 70∼80 nm diameter pores can be shrunk down to sub-10 nm diameter and that the ionic transport of KCl electrolyte can be efficiently manipulated by the embedded electrode within the membrane. © 2009 American Chemical Society.
O.F. Schirmer, K.W. Blazey, et al.
Physical Review B
B.A. Hutchins, T.N. Rhodin, et al.
Surface Science
Julien Autebert, Aditya Kashyap, et al.
Langmuir
Surendra B. Anantharaman, Joachim Kohlbrecher, et al.
MRS Fall Meeting 2020