Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
Two new methods for attaining convergence in self-consistent field calculations are described. They have been applied to semiconductor inversion layers at finite temperature. © 1970.
Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
Heinz Koeppl, Marc Hafner, et al.
BMC Bioinformatics
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
M. Shub, B. Weiss
Ergodic Theory and Dynamical Systems