Min Yang, Jeremy Schaub, et al.
Technical Digest-International Electron Devices Meeting
Time-resolved mass spectrometry is used to study the desorbed species due to laser-induced etching of a solid CuCl and a chlorinated Cu surface. The observed desorption threshold, mass distribution and kinetic energies of the desorbed atoms and molecules at 355 and 532 nm radiation show that the laser-induced etching process is not simply thermal evaporation. It is suggested that competing nonthermal mechanisms due to electronic excitations may be very important in laser-induced desorption and etching. These processes are different for a solid CuCl and a chlorinated Cu surface. For laser-induced etching of Cu surfaces, chlorination of Cu is essential; however, formation of stoichiometric CuCl is not necessary. Excess Cu in the surface layer is responsible for the observed different etching behavior of a chlorinated Cu and a solid CuCl surface. The effect of laser radiation on these surfaces and possible etching mechanisms are discussed based on the experimental observations. © 1986 Springer-Verlag.
Min Yang, Jeremy Schaub, et al.
Technical Digest-International Electron Devices Meeting
G. Will, N. Masciocchi, et al.
Zeitschrift fur Kristallographie - New Crystal Structures
J.V. Harzer, B. Hillebrands, et al.
Journal of Magnetism and Magnetic Materials
J. Paraszczak, J.M. Shaw, et al.
Micro and Nano Engineering