Surendra B. Anantharaman, Joachim Kohlbrecher, et al.
MRS Fall Meeting 2020
Paper
Light scattering properties of x-ray lithography mask substrates
Abstract
Experimental results are presented on the light scattering properties of x-ray mask substrates relevant to x-ray lithography systems utilizing optical alignment between mask and wafer. The results are compared with a simple light scattering model simulating the contrast in a bright field mask/wafer alignment system. © 1991.
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