Conference paper
Learning Reduced Order Dynamics via Geometric Representations
Imran Nasim, Melanie Weber
SCML 2024
Experimental results are presented on the light scattering properties of x-ray mask substrates relevant to x-ray lithography systems utilizing optical alignment between mask and wafer. The results are compared with a simple light scattering model simulating the contrast in a bright field mask/wafer alignment system. © 1991.
Imran Nasim, Melanie Weber
SCML 2024
Daniel J. Coady, Amanda C. Engler, et al.
ACS Macro Letters
H.D. Dulman, R.H. Pantell, et al.
Physical Review B
Lawrence Suchow, Norman R. Stemple
JES