J. Tersoff
Applied Surface Science
Experimental results are presented on the light scattering properties of x-ray mask substrates relevant to x-ray lithography systems utilizing optical alignment between mask and wafer. The results are compared with a simple light scattering model simulating the contrast in a bright field mask/wafer alignment system. © 1991.
J. Tersoff
Applied Surface Science
Shu-Jen Han, Dharmendar Reddy, et al.
ACS Nano
Heinz Schmid, Hans Biebuyck, et al.
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
S.F. Fan, W.B. Yun, et al.
Proceedings of SPIE 1989