Publication
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Paper
Low stress development of poly(methylmethacrylate) for high aspect ratio structures
Abstract
Magnetic head requirements for high aspect ratio pole tips were met using single-layer PMMA exposed at 100 kV. Using cooled mixtures of IPA and water and ultrasonic agitation, 14:1 aspect ratios in resist were demonstrated.