Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Given a graph G with m edges and n nodes, a spanning tree T of G, and an edge e that is being deleted from or inserted into G, we give efficient O (n) algorithms to compute a possible swap for e that minimizes the diameter of the new spanning tree. This problem arises in high-speed networks, particularly in optical networks. © 1998 Springer-Verlag New York Inc.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
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IEEE Transactions on Pattern Analysis and Machine Intelligence
Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007
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