PublicationAmerican Chemical Society, Polymer Preprints, Division of Polymer ChemistryPaperMechanistic studies of chemically amplified photoresistsAmerican Chemical Society, Polymer Preprints, Division of Polymer ChemistryAbstractNo abstract availableHome↳ PublicationsDate01 Apr 1997PublicationAmerican Chemical Society, Polymer Preprints, Division of Polymer ChemistryAuthorsW.D. HinsbergG.M. WallraffF.A. HouleJ.E. FrommerR. BeyersIBM-affiliated at time of publicationShare