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American Chemical Society, Polymer Preprints, Division of Polymer Chemistry
Paper
01 Apr 1997

Mechanistic studies of chemically amplified photoresists

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Date

01 Apr 1997

Publication

American Chemical Society, Polymer Preprints, Division of Polymer Chemistry

Authors

  • W.D. Hinsberg
  • G.M. Wallraff
  • F.A. Houle
  • J.E. Frommer
  • R. Beyers
IBM-affiliated at time of publication

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