Chemistry controlling nanoscale pattern formation by deep UV photolithography
- F.A. Houle
- W.D. Hinsberg
- et al.
- 1999
- ACS Spring 1999
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
Date
Featured collections
Popular topics
101 results for Gregory M. Wallraff
Methacrylate terpolymer approach in the design of a family of chemically amplified positive resists
- R.D. Allen
- G.M. Wallraff
- et al.
- 1991
- ACS Spring 1991
Base-catalyzed photosensitive polyimide
- D.R. McKean
- G.M. Wallraff
- et al.
- 1991
- ACS Spring 1991
Sensitive polysilane resists for bilayer lithography
- G.M. Wallraff
- R.D. Miller
- et al.
- 1991
- ACS Spring 1991
Chemically amplified photoresist for visible laser direct imaging
- G.M. Wallraff
- R.D. Allen
- et al.
- 1991
- ACS Spring 1991
Synthesis and lithographic performance of photosensitive poly(phenylquinoxaline)s and related structures
- G.M. Wallraff
- J.L. Hedrick
- et al.
- 1991
- ACS Spring 1991
Large-area spatially ordered arrays of gold nanoparticles directed by lithographically confined DNA origami
- Albert M. Hung
- Christine M. Micheel
- et al.
- 2009
- Nature Nanotechnology
Placement and orientation of individual DNA shapes on lithographically patterned surfaces
- Ryan J. Kershner
- Luisa D. Bozano
- et al.
- 2009
- Nature Nanotechnology
Light-directed synthesis of high-density oligonucleotide arrays using semiconductor photoresists
- Glenn Mcgall
- Jeff Labadie
- et al.
- 1996
- PNAS
Solution Photochemistry of Poly(di-n-alkylsilane)s. An EPR-ENDOR Study of the Structure of the Persistent Radicals
- Allan J. McKinley
- Takashi Karatsu
- et al.
- 1991
- JACS