A.B. McLean, R.H. Williams
Journal of Physics C: Solid State Physics
The phenomenon of metastable phase formation during a constant temperature and constant pressure thin film reaction is explained by a kinetic model emphasizing the rate of transition. It is assumed that the reaction obeys a maximum time-dependent rather than time-independent negative free energy change. The product persists in the metastable state due to a high activation barrier to later transition. © 1991.
A.B. McLean, R.H. Williams
Journal of Physics C: Solid State Physics
Elizabeth A. Sholler, Frederick M. Meyer, et al.
SPIE AeroSense 1997
F.J. Himpsel, T.A. Jung, et al.
Surface Review and Letters
Oliver Schilter, Alain Vaucher, et al.
Digital Discovery