Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
The effect of N content on the structure and properties of rf relatively sputtered α-SiNx was investigated. The N content in the α-SiNx film increases with the N2 flow rate until the stoichiometric composition (Si3N4) is reached. The refractive index asymptotically reaches 1.99 as the N/Si ratio approaches 1.33. The maximum density of 3.2 g/cm3 and hardness of 25 GPa are attained at the stoichiometric composition.
Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
M.A. Lutz, R.M. Feenstra, et al.
Surface Science
Ronald Troutman
Synthetic Metals
Imran Nasim, Melanie Weber
SCML 2024