Chiew-Seng Koay, Nelson Felix, et al.
SPIE Advanced Lithography 2016
In this paper, we study the impact of topographic guide or template properties on pattern formation in a directed self-Assembly (DSA) process. In particular, we investigate the relationship between free energy and defect generation or process robustness, and analyze the influence of guide affinity. The good correlation between experimental and simulation results confirms the role of certain setup parameters and process conditions on the DSA patterning.
Chiew-Seng Koay, Nelson Felix, et al.
SPIE Advanced Lithography 2016
Lei Sun, Nicole Saulnier, et al.
SPIE Advanced Lithography 2016
R. Muthinti, Nicolas Loubet, et al.
SPIE Advanced Lithography 2016
Rudy J. Wojtecki, Ellie Porath, et al.
SPIE Advanced Lithography 2016