D. Manzer, R. Lane, et al.
Proceedings of SPIE 1989
An ion gun has been modified to operate in a continuously pumped mode, in which gas is leaked directly into the ionization region, and the vacuum system is pumped to ∼10-7 Torr Ar by a helium cryopump. A milling rate of 3.8 Å/sec was obtained for SiO2 using 2 keV Ar ions. Sample to gun distance was 5 cm. This may be compared with the rate 0.8 Å/sec, obtained when operating in a static vacuum of 5×10-5 Torr Ar.
D. Manzer, R. Lane, et al.
Proceedings of SPIE 1989
R.A. Budd, D.B. Dove, et al.
Microlithography 1994
M.R. Wordeman, A.M. Schweighart, et al.
VLSI Technology 1983
W. Molzen, Michael G. Rosenfield, et al.
Proceedings of SPIE 1989