Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
This paper presents new relationships between the higher-order moments of the FIFO and LIFO disciplines. These relationships hold over a class of queueing models that include M/G/1 queues with exceptional first service, M/G/1 queues with server vacations, and M/G/1 priority models. The results also generalize to a class of service disciplines that includes FIFO and LIFO as special cases. © 1992 J.C. Baltzer A.G. Scientific Publishing Company.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Raymond F. Boyce, Donald D. Chamberlin, et al.
CACM
Liqun Chen, Matthias Enzmann, et al.
FC 2005
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ACM/IEEE SC 2006