G. Will, N. Masciocchi, et al.
Zeitschrift fur Kristallographie - New Crystal Structures
A field effect transistor device (FET), consisting of a nonlinear Mott Insulator channel material, and a high dielectric-constant gate oxide, is explored as a nanoscale device. Experimental functionality of a large scale prototype (5 μm channel length) has been demonstrated. The underlying physics of the device is analyzed and modeled using a time-dependent Hartree approach. Timing estimates suggest a relatively short switching time.
G. Will, N. Masciocchi, et al.
Zeitschrift fur Kristallographie - New Crystal Structures
O.F. Schirmer, K.W. Blazey, et al.
Physical Review B
S. Cohen, T.O. Sedgwick, et al.
MRS Proceedings 1983
R.J. Gambino, N.R. Stemple, et al.
Journal of Physics and Chemistry of Solids