Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Thin films of an ordered polystyrene-polymethyl(methacrylate) (PS-PMMA) diblock copolymer was formed over full 8-in.-diam silicon wafers and on various substrate materials. The important process parameters for forming the nanoscale templates were analyzed. It was found that under proper conditions, well-ordered hexagonal arrays of sub-20 nm domains can be formed on a tight pitch.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
S. Cohen, J.C. Liu, et al.
MRS Spring Meeting 1999
A. Gupta, R. Gross, et al.
SPIE Advances in Semiconductors and Superconductors 1990
Fernando Marianno, Wang Zhou, et al.
INFORMS 2021