E. Babich, J. Paraszczak, et al.
Microelectronic Engineering
Thin films of an ordered polystyrene-polymethyl(methacrylate) (PS-PMMA) diblock copolymer was formed over full 8-in.-diam silicon wafers and on various substrate materials. The important process parameters for forming the nanoscale templates were analyzed. It was found that under proper conditions, well-ordered hexagonal arrays of sub-20 nm domains can be formed on a tight pitch.
E. Babich, J. Paraszczak, et al.
Microelectronic Engineering
Sung Ho Kim, Oun-Ho Park, et al.
Small
R.W. Gammon, E. Courtens, et al.
Physical Review B
A. Ney, R. Rajaram, et al.
Journal of Magnetism and Magnetic Materials