Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
New omega results are given for the error term in a weighted divisor problem, improving results of Schierwagen. The Ω+ result is improved (surprisingly, perhaps) by a logarithm factor in all cases. The methods are similar to earlier results of the author for Dirichlet's divisor problem and in fact, with a slight modification of the argument, include that result as a special case. The Ω- result is improved by an exponential of iterated logarithms, similar to results of Kátai and Corrádi, and Joris and Redmond. Both results rely on a Voronoi-type identity for the error term due to Krätzel. © 1988.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Juliann Opitz, Robert D. Allen, et al.
Microlithography 1998
Jonathan Ashley, Brian Marcus, et al.
Ergodic Theory and Dynamical Systems
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009