Conference paper
Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
A simple method is shown for computing the Airy stress function for two-dimensional problems. The method is applied to a simple mechanics example and to large computer-generated atomic models whose properties are independent of some coordinate z. The method has recently proved useful for analyzing topological defects in computer-generated models of amorphous solids. © 1981.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
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BMC Bioinformatics
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