Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Let A=(aij) be a real symmetric matrix of order n. We characterize all nonnegative vectors x=(x1,...,xn) and y=(y1,...,yn) such that any real symmetric matrix B=(bij), with bij=aij, i≠jhas its eigenvalues in the union of the intervals [bij-yi, bij+ xi]. Moreover, given such a set of intervals, we derive better bounds for the eigenvalues of B using the 2n quantities {bii-y, bii+xi}, i=1,..., n. © 1981.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Amir Ali Ahmadi, Raphaël M. Jungers, et al.
SICON
Vladimir Yanovski, Israel A. Wagner, et al.
Ann. Math. Artif. Intell.
David L. Shealy, John A. Hoffnagle
SPIE Optical Engineering + Applications 2007