Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
It has recently become feasible to compute information rates of finite-state source/channel models with not too many states. In this paper, we apply such methods to finite-state approximations of channels that are not finite-state. In this way, an upper bound and a conjectured lower bound on the information rate of the actual channel can be computed.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Richard M. Karp, Raymond E. Miller
Journal of Computer and System Sciences
Vladimir Yanovski, Israel A. Wagner, et al.
Ann. Math. Artif. Intell.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009