Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
This paper examines the complexity of several geometric problems due to unbounded dimension. The problems considered are: (i) minimum cover of points by unit cubes, (ii) minimum cover of points by unit balls, and (iii) minimum number of lines to hit a set of balls. Each of these problems is proven not to have a polynomial approximation scheme unless P = NP. Specific lower bounds on the error ratios attainable in polynomial time are given, assuming P ≠ NP. In particular, it is shown that covering by two cubes is in P while covering by three cubes is NP-complete. © 1990, Academic Press Limited. All rights reserved.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Michael E. Henderson
International Journal of Bifurcation and Chaos in Applied Sciences and Engineering
Imran Nasim, Melanie Weber
SCML 2024
William Hinsberg, Joy Cheng, et al.
SPIE Advanced Lithography 2010