Full metal gate with borderless contact for 14 nm and beyond
Soon-Cheon Seo, L.F. Edge, et al.
VLSI Technology 2011
In this letter we show that UV illumination of porous silicon causes a decrease in its luminescence efficiency. Infrared measurements allow us to associate the efficiency decrease with a loss of hydrogen from the silicon surface. We also find that the rate at which the luminescence intensity degrades increases rapidly when the illumination energy exceeds a threshold near 3.0 eV. We conclude that the decrease in photoluminescence efficiency occurs as a result of optically induced hydrogen desorption and discuss possible explanations for the energy threshold.
Soon-Cheon Seo, L.F. Edge, et al.
VLSI Technology 2011
R.W. Ade, E.R. Fossum, et al.
Proceedings of SPIE 1989
J.H. Stathis
Journal of Applied Physics
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Applied Physics Letters