PaperIon-beam-assisted etching of Si with fluorine at low temperaturesC.B. Mullins, J.W. CoburnJournal of Applied Physics
PaperOptical emission spectroscopy of reactive plasmas: A method for correlating emission intensities to reactive particle densityJ.W. Coburn, M. ChenJournal of Applied Physics
PaperDiagnostics of an r.f. sputtering glow discharge - correlation between atomic absorption and mass spectrometryE.W. Eckstein, J.W. Coburn, et al.International Journal of Mass Spectrometry and Ion Physics
