PaperIon-beam-assisted etching of Si with fluorine at low temperaturesC.B. Mullins, J.W. CoburnJournal of Applied Physics
PaperInfluence of the altered layer on depth profiling measurementsHarold F. Winters, J.W. CoburnApplied Physics Letters
PaperElemental composition profiling in thin films by glow-discharge mass spectrometry: Depth resolutionJ.W. Coburn, E.W. Eckstein, et al.Journal of Applied Physics
