Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Policies that address security and privacy are pervasive parts of both technical and social systems, and technology that enables both organizations and individuals to create and manage such policies is a critical need in information technology (IT). This paper describes the notion of end-to-end policy management and advances a framework that can be useful in understanding the commonality in IT security and privacy policy management. © Copyright 2009 by International Business Machines Corporation.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Erich P. Stuntebeck, John S. Davis II, et al.
HotMobile 2008
Hang-Yip Liu, Steffen Schulze, et al.
Proceedings of SPIE - The International Society for Optical Engineering
Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007