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Conference paperHigh-performance sub-0.08 μm CMOS with dual gate oxide and 9.7 ps inverter delayM. Hargrove, S.W. Crowder, et al.IEDM 1998
PaperSilylation of resist materials using di- and polyfunctional organosilicon compoundsE. Babich, J. Paraszczak, et al.Microelectronic Engineering
PaperLight-coupling masks: An alternative, lensless approach to high-resolution optical contact lithographyHeinz Schmid, Hans Biebuyck, et al.Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
