Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
The limits of accuracy in an automatic wavelength-scanning ellipsometer are defined on the basis of measured mechanical properties of the instrument and the geometrical and optical defects of the optical components. A computational procedure is described for obtaining accurate Δ and ψ values by using a matrix model of the instrument, and the areás in which the greatest improvements in accuracy can be achieved are identified. © 1976.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Robert W. Keyes
Physical Review B
D.D. Awschalom, J.-M. Halbout
Journal of Magnetism and Magnetic Materials
I.K. Pour, D.J. Krajnovich, et al.
SPIE Optical Materials for High Average Power Lasers 1992