American Chemical Society, Polymer Preprints, Division of Polymer Chemistry

Paper

01 Aug 1996

Preparation of lithographic resist materials by anionic polymerization

Paper

Penultimate effect in radical copolymerization of 2- trifluoromethylacrylates

Hiroshi Ito, Brian C. Trinque, et al.

J Polym Sci Part A

Conference paper

Aqueous base developable deep uv resist systems based on novel monomeric and polymeric dissolution inhibitors

Hiroshi Ito

Proceedings of SPIE 1989

Paper

Novel Polymeric Dissolution Inhibitor for the Design of Sensitive, Dry Etch Resistant, Base-Developable Resist

Hiroshi Ito, Elizabeth Flores, et al.

JES

Paper

Approach toward environmental stabilization of chemical amplification resists

Hiroshi Ito, William P. England, et al.

J. Photopolym. Sci. Tech.

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