American Chemical Society, Polymer Preprints, Division of Polymer Chemistry

Paper

01 Aug 1996

Preparation of lithographic resist materials by anionic polymerization

Paper

Lithographic feasibility of escap beyond quarter micron

Hiroshi Ito, Greg Breyta, et al.

J. Photopolym. Sci. Tech.

Conference paper

Reactive dissolution kinetics of lithographic copolymers

William Hinsberg, Frances Houle, et al.

Microlithography 2004

Conference paper

Impact of thin resist processes on post-etch LER

Arpan P. Mahorowala, Dario L. Goldfarb, et al.

Microlithography 2003

Paper

Radical Copolymerization of 2-Trifluoromethylacrylic Monomers. I. Kinetics of Their Copolymerization with Norbornenes and Vinyl Ethers as Studied by in situ ¹H NMR Analysis

Hiroshi Ito, Dolores C. Miller

J Polym Sci Part A

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