R. Ghez, M.B. Small
JES
Photoemission secondary-electron energy distributions and yield measurements for (100) EuO show that "quasielastic" rather than inelastic electron scattering dominates the photoemission escape process for electrons excited within a few eV of threshold. In this "quasielastic" scattering regime (with a large effective escape depth ∼ 50-100), it is suggested that the spin polarization need not be conserved in the photoemission escape process, and that reported "paramagnetic" spin-polarized photoemission at 10 °K is possibly due to quasielastic spin-flip scattering. © 1973 The American Physical Society.
R. Ghez, M.B. Small
JES
Ronald Troutman
Synthetic Metals
Xikun Hu, Wenlin Liu, et al.
IEEE J-STARS
J.H. Stathis, R. Bolam, et al.
INFOS 2005