T. Schneider, E. Stoll
Physical Review B
Analogues of poly(methyl methacrylate) (PMMA) incorporating halogen atoms in the α-position or in the ester side group have recently attracted much attention as sensitive electron-beam positive resists. Ito et al. have reported that methyl α-(trifluoromethyl)acrylate(MTFMA) does not undergo radical homopolymerization but readily polymerizes bypyridine initiation due to the low electron density on the double bond. © 1984, American Chemical Society. All rights reserved.
T. Schneider, E. Stoll
Physical Review B
A. Krol, C.J. Sher, et al.
Surface Science
R.J. Gambino, N.R. Stemple, et al.
Journal of Physics and Chemistry of Solids
J.H. Kaufman, Owen R. Melroy, et al.
Synthetic Metals