Conference paper
Characterization of line width variation
Alfred K. Wong, Antoinette F. Molless, et al.
SPIE Advanced Lithography 2000
Many VLSI circuits to which WR might be applied exhibit a regular, symmetric structure. For such circuits, general spectral estimates of the convergence rate are not necessarily very accurate. By relying on a detailed analysis of the system structure, estimates for the convergence of the waveform relaxation method are given for RC circuits arising as simplified models of a VLSI interconnect. These examples suggest a new approach to WR convergence estimation. © 1993.
Alfred K. Wong, Antoinette F. Molless, et al.
SPIE Advanced Lithography 2000
Moutaz Fakhry, Yuri Granik, et al.
SPIE Photomask Technology + EUV Lithography 2011
Y.Y. Li, K.S. Leung, et al.
J Combin Optim
Ehud Altman, Kenneth R. Brown, et al.
PRX Quantum