J. Paraszczak, J.M. Shaw, et al.
Micro and Nano Engineering
Scanning probe nanolithography (SPL) has demonstrated its potential in a variety of applications like 3D nanopatterning, 'direct development' lithography, dip-pen deposition or patterning of self-assembled monolayers. One of the main issues holding back SPL has been the limited throughput for patterning and imaging. Here we present a complete lithography and metrology system based on thermomechanical writing into organic resists. Metrology is carried out using a thermoelectric topography sensing method. More specifically, we demonstrate a system with a patterning pixel clock of 500kHz, 20mms - 1 linear scan speed, a positioning accuracy of 10nm, a read-back frequency bandwidth of 100 000line-pairss- 1 and a turnaround time from patterning to qualifying metrology of 1min. Thus, we demonstrate a nanolithography system capable of implementing rapid turnaround. © 2011 IOP Publishing Ltd.
J. Paraszczak, J.M. Shaw, et al.
Micro and Nano Engineering
Stefan Fringes, Felix Holzner, et al.
Beilstein Journal of Nanotechnology
S. Cohen, T.O. Sedgwick, et al.
MRS Proceedings 1983
Zelek S. Herman, Robert F. Kirchner, et al.
Inorganic Chemistry