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Stress-driven segregation at a Si-Ge alloy surface
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Symposium on Process Physics and Modeling in Semiconductor Technology 1990
A Comment on the Letter by J. M. Langer and H. Heinrich, Phys. Rev. Lett. 55, 1414 (1985). © 1986 The American Physical Society.
J. Tersoff, P.C. Kelires
Symposium on Process Physics and Modeling in Semiconductor Technology 1990
J. Tersoff
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