Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Paper
Response to the paper of Lodder "momentum-balance considerations in electromigration revisited"
Abstract
No abstract available.
Related
G. Will, N. Masciocchi, et al.
Zeitschrift fur Kristallographie - New Crystal Structures
Shu-Jen Han, Dharmendar Reddy, et al.
ACS Nano
Frank Stem
C R C Critical Reviews in Solid State Sciences