Optimizing history effects in 65nm PD-SOI CMOS
Q. Liang, T. Kawamura, et al.
IEEE International SOI Conference 2006
An insightful analysis of the floating-body (FB) effect on off-state current (I off) in PD/SOI MOSFET's is done based on simulations calibrated to a published scaled SOI CMOS technology [1]. In contrast to the conclusion drawn in [1], the simulations reveal that proven, easily integrated processes for enhancing carrier recombination in the source/drain junction region, in conjunction with normal elevated chip temperature of operation, can effectively suppress the FB-induced increase of I off, thus enabling exploitation of the unique benefits of scaled PD/SOI CMOS circuits.
Q. Liang, T. Kawamura, et al.
IEEE International SOI Conference 2006
Keunwoo Kim, Jerry G. Fossum, et al.
International Journal of Electronics
Duckhyun Chang, Jerry G. Fossum, et al.
IEEE Electron Device Letters
Mario M. Pelella, Jerry G. Fossum, et al.
IEEE Electron Device Letters