Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
A machine model in which load operations can be performed in parallel with arithmetic operations by two separate functional units is considered. For this model, the evaluation of a set of expression trees is discussed. A dynamic programming algorithm for producing an approximate solution is described and analyzed. For binary trees its worse-case cost is at most min (1.091, 1 + (2 log n)/n) times the optimal cost.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Limin Hu
IEEE/ACM Transactions on Networking
Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007
Rafae Bhatti, Elisa Bertino, et al.
Communications of the ACM