PaperCorrosion-free dry etch patterning of magnetic random access memory stacks: Effects of ultraviolet illuminationH. Cho, K.-P. Lee, et al.Journal of Applied Physics
PaperComparison of Cl2 and F2 based chemistries for the inductively coupled plasma etching of NiMnSb thin filmsJ. Hong, J.A. Caballero, et al.Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
PaperExtended x-ray absorption fine structure studies by soft x-ray fluorescence detectionF. Sette, S.J. Pearton, et al.Physica Scripta