Physical Review Letters

Paper

23 Mar 1987

Sette et al. respond

View publication

Abstract

No abstract available.

Conference paper

Effect of inert gas additive on Cl₂-based inductively coupled plasma etching of NiFe and NiFeCo

K.B. Jung, H. Cho, et al.

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Paper

Extended x-ray absorption fine structure studies by soft x-ray fluorescence detection

F. Sette, S.J. Pearton, et al.

Physica Scripta

Paper

Parametric study of NiFe and NiFeCo high density plasma etching using CO/NH₃

K.B. Jung, J. Hong, et al.

JES

Paper

Comparison of Cl₂/He, Cl₂/Ar, and Cl₂/Xe plasma chemistries for dry etching of NiFe and NiFeCo

K.B. Jung, H. Cho, et al.

JES

View all publications