Thomas E. Karis, C. Mark Seymour, et al.
Rheologica Acta
High resolution soft X-ray photoemission spectra of Si(111) surfaces subjected to steady-state etching are reported. The reaction is shown to proceed via the formation of a thick, highly fluorinated reaction layer, dominated by trifluorosilyl moieties. In addition, SiF4, the major reaction product has been observed in the spectra, indicating that it may be trapped within the reaction layer. The implications of these measurements for previously proposed reaction mechanisms are discussed. © 1986.
Thomas E. Karis, C. Mark Seymour, et al.
Rheologica Acta
J.H. Stathis, R. Bolam, et al.
INFOS 2005
F.J. Himpsel, T.A. Jung, et al.
Surface Review and Letters
I.K. Pour, D.J. Krajnovich, et al.
SPIE Optical Materials for High Average Power Lasers 1992