P. Martensson, R.M. Feenstra
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Spectroscopic studies of Si(100) fluorinated by the dissociative chemisorption of XeF2 at 80 K are reported. LEED and XPS measurements suggest the formation of a disordered fluorosilyl layer after low fluorine doses. Separate EELS experiments identified a fluorine induced 800 cm −1loss, suggesting that SiF is the major surface fluorosilyl species. Vibrational evidence for coadsorbed hydrogen, due to side reactions during fluorination, is also found. Recent synchrotron soft x-ray photoemission spectra support the SiF identification and also demonstrate dramatic crystallographic effects in comparative Si(111) studies. © 1984, American Vacuum Society. All rights reserved.
P. Martensson, R.M. Feenstra
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Andreas C. Cangellaris, Karen M. Coperich, et al.
EMC 2001
J. Paraszczak, J.M. Shaw, et al.
Micro and Nano Engineering
I.K. Pour, D.J. Krajnovich, et al.
SPIE Optical Materials for High Average Power Lasers 1992