Robert W. Keyes
Physical Review B
Paper
Summary Abstract: A Quantitative Ion Beam Process Applied to the Deposition of Aluminum Nitride Thin Films
Abstract
No abstract available.
Related
P.C. Pattnaik, D.M. Newns
Physical Review B
Thomas H. Baum, Carl E. Larson, et al.
Journal of Organometallic Chemistry
Min Yang, Jeremy Schaub, et al.
Technical Digest-International Electron Devices Meeting